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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12546379 B1

PDFFull Text
Date of Patent:
Feb. 10, 2026

Filed:

Apr. 11, 2022

Positioning system, a lithographic apparatus, a driving force attenuation method, and a device manufacturing method

Applicants:

Asml Netherlands B.v., Veldhoven, NL;

Carl Zeiss Smt Gmbh, Oberkochen, DE;

Inventors:

Maarten Hartger Kimman, Veldhoven, NL;

Hans Butler, Best, NL;

Johannes Petrus Martinus Bernardus Vermeulen, Leende, NL;

Stefan Troger, Ulm, DE;

Michael Erath, Dietenheim, DE;

Philipp Gaida, Aalen, DE;

Assignee:

ASML NETHERLANDS B.V., Veldhoven, NL;

Attorney:

Pillsbury Winthrop Shaw Pittman, LLP

Primary Examiner:

Mesfin T Asfaw

Int. Cl.
CPC ...
G03F 7/20 (2006.01); F16F 15/08 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
F16F 15/08 (2013.01); G03F 7/70825 (2013.01); G03F 7/709 (2013.01);
Abstract

A positioning system for moving or positioning a moveable object, the system including: a dynamic support system including a reaction mass, a first support, a first spring system to support the reaction mass from the first support, a second support, a second spring system to support the first support from the second support, and a damping system to provide damping to the dynamic support system; and an actuator for generating a driving force between the moveable object and the reaction mass for moving or position the object, wherein a first eigenfrequency and a second eigenfrequency of the dynamic support system are substantially the same.

Find Patent Forward Citations

Kimman, Maarten. (2026). Positioning system, a lithographic apparatus, a driving force attenuation method, and a device manufacturing method (U.S. Patent No. 12546379). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12546379

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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