The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 03, 2026

Filed:

Jan. 31, 2023
Applicant:

Asm Ip Holding, B.v., Almere, NL;

Inventors:

Georgi Popov, Helsinki, FI;

Alexander Weiss, Vantaa, FI;

Mikko Ritala, Espoo, FI;

Marianna Kemell, Helsinki, FI;

Assignee:

ASM IP Holding B.V., Almere, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/3205 (2006.01);
U.S. Cl.
CPC ...
H01L 21/32051 (2013.01);
Abstract

The current disclosure relates to a method of depositing a metal halide-comprising material on a substrate by a cyclic deposition process. The method comprises providing a substrate in a reaction chamber, providing a metal precursor into the reaction chamber in a vapor phase and providing a halogen precursor into the reaction chamber in a vapor phase to form the metal halide-comprising material on the substrate. In the method, the metal precursor comprises a metal atom having an oxidation state of +1 bonded to an organic ligand. Also, a deposition assembly for depositing a metal halide-comprising material is disclosed.


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Popov, Georgi. (2026). Vapor deposition processes and a deposition assembly (U.S. Patent No. 12543519). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12543519

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