The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 03, 2026

Filed:

Feb. 23, 2023
Applicant:

Globalfoundries U.s. Inc., Malta, NY (US);

Inventors:

Anindya Nath, Essex Junction, VT (US);

Rajendran Krishnasamy, Essex Junction, VT (US);

Robert J. Gauthier, Jr., Williston, VT (US);

Assignee:

GlobalFoundries U.S. Inc., Malta, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H10D 89/60 (2025.01); H10D 8/80 (2025.01);
U.S. Cl.
CPC ...
H10D 89/713 (2025.01); H10D 8/80 (2025.01);
Abstract

Embodiments of the disclosure provide a structure including a semiconductor substrate. The semiconductor substrate includes a porous semiconductor region, the porous semiconductor region including a cavity. The cavity includes a semiconductor layer therein. The porous semiconductor further includes a device. The device includes a first well at least partially in the semiconductor layer and a second well at least partially in the semiconductor layer and positioned laterally immediately adjacent the first well. The device further includes a first doped region abutting the first well; and a second doped region abutting the second well, wherein the first well and the second doped region have a first type conductivity and the second well and the first doped region having a second type conductivity that is different from the first type conductivity.


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