The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 03, 2026
Filed:
Mar. 05, 2021
Applicant:
Mitsubishi Materials Corporation, Tokyo, JP;
Inventors:
Fumiaki Ishikawa, Saitama, JP;
Yuto Kurata, Amagasaki, JP;
Tsukasa Yasoshima, Sanda, JP;
Ichiro Shiono, Amagasaki, JP;
Takuma Katase, Sanda, JP;
Assignee:
MITSUBISHI MATERIALS CORPORATION, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32642 (2013.01); H01J 37/3244 (2013.01); H01J 37/32541 (2013.01); H01J 37/3255 (2013.01); H01L 21/68721 (2013.01); H01J 2237/334 (2013.01);
Abstract
A member for a plasma processing apparatus includes a base material and a heat transfer layer provided on one surface of the base material, and the heat transfer layer contains at least one of a fluorine-based resin and a fluorine-based elastomer.
Ishikawa, Fumiaki. (2026). Member for plasma processing apparatus, method for manufacturing same, and plasma processing apparatus (U.S. Patent No. 12542258). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12542258
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile