The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 27, 2026

Filed:

Jul. 03, 2023
Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;

Inventors:

Yu-Lung Tung, Kaohsiung, TW;

Xiaodong Wang, Hsinchu, TW;

Jhon-Jhy Liaw, Zhudong Township, Hsinchu County, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10D 62/10 (2025.01); H10D 30/01 (2025.01); H10D 30/43 (2025.01); H10D 30/67 (2025.01); H10D 62/13 (2025.01); H10D 64/01 (2025.01); H10D 84/85 (2025.01);
U.S. Cl.
CPC ...
H10D 62/121 (2025.01); H10D 30/014 (2025.01); H10D 30/43 (2025.01); H10D 30/6735 (2025.01); H10D 30/6757 (2025.01); H10D 62/151 (2025.01); H10D 64/017 (2025.01); H10D 84/85 (2025.01);
Abstract

A semiconductor structure is provided. A logic cell includes first and second nanostructure transistors. The first nanostructure transistor is formed in a first active region over a first well region having a first conductivity type. The second nanostructure transistor is formed in a second active region over a second well region having a second conductivity type. The first and second nanostructure transistors share a gate structure. First and second source/drain features of the first nanostructure transistor are formed in the first active region. Third and fourth source/drain features of the second nanostructure transistor are formed in a first portion and a second portion of the second active region, respectively. A first distance between the first active region and the first portion of the second active region is different from a second distance between the first active region and the second portion of the second active region.


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