The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 20, 2026

Filed:

Apr. 29, 2019
Applicant:

Lam Research Corporation, Fremont, CA (US);

Inventors:

Zhian He, Lake Oswego, OR (US);

Shantinath Ghongadi, Tigard, OR (US);

Hyungjun Hur, Tigard, OR (US);

Ludan Huang, King City, OR (US);

Jingbin Feng, Lake Oswego, OR (US);

Douglas Hill, Tigard, OR (US);

Thomas Burke, Newberg, OR (US);

Manish Ranjan, Sherwood, OR (US);

Andrew James Pfau, Portland, OR (US);

Assignee:

Lam Research Corporation, Fremont, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/768 (2006.01); H01L 21/285 (2006.01);
U.S. Cl.
CPC ...
H01L 21/76876 (2013.01); H01L 21/28562 (2013.01); H01L 21/76883 (2013.01);
Abstract

Various embodiments include methods and apparatuses to moisturize a substrate prior to an electrochemical deposition process. In one embodiment, a method to control substrate wettability includes placing a substrate in a pre-treatment chamber, controlling an environment of the pre-treatment chamber to moisturize a surface of the substrate; and placing the substrate into a plating cell. Other methods and systems are disclosed.


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