The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 13, 2026

Filed:

Nov. 03, 2022
Applicant:

Globalfoundries Singapore Pte. Ltd., Singapore, SG;

Inventors:

Bong Woong Mun, Singapore, SG;

Athena Jacinto Antonio, Singapore, SG;

Jeoung Mo Koo, Singapore, SG;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 23/535 (2006.01); H01L 23/48 (2006.01); H01L 23/528 (2006.01); H10D 84/01 (2025.01); H10D 84/03 (2025.01);
U.S. Cl.
CPC ...
H01L 23/535 (2013.01); H01L 23/481 (2013.01); H01L 23/5286 (2013.01); H10D 84/0149 (2025.01); H10D 84/038 (2025.01);
Abstract

A transistor is provided. The transistor includes a substrate, a first diffusion region, a first contact structure, a second diffusion region, a second contact structure, and a gate structure. The first diffusion region is in the substrate. The first contact structure is over the substrate electrically coupling the first diffusion region. The first contact structure includes a first conductive material. The second diffusion region is in the substrate. The second contact structure is in the substrate electrically coupling the second diffusion region. The second contact structure includes a second conductive material different from the first conductive material. The gate structure is between the first contact structure and the second contact structure.


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