The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 13, 2026
Filed:
Feb. 17, 2023
Tokyo Electron Limited, Tokyo, JP;
Yusuke Aoki, Miyagi, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
A plasma processing apparatus includes an electrostatic chuck that adsorbs a substrate, a relay circuit that turns ON and OFF the supply of voltage to the electrostatic electrode, a plasma generator, and a controller. The controller (a) controls the DC power supply to supply the voltage to the electrostatic electrode, thereby adsorbing the substrate to the electrostatic chuck, (b) controls the relay circuit to turn OFF the supply of the voltage to the electrostatic electrode, thereby bringing the electrostatic electrode into a floating state, (c) controls the plasma generator to start a plasma processing of the substrate, (d) controls the relay circuit to turn ON the supply of the voltage to the electrostatic electrode, thereby acquiring current flowing through the power supply line, and (e) determines an adsorbed state of the substrate based on the current.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile