The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 13, 2026

Filed:

Dec. 30, 2022
Applicant:

Nuflare Technology, Inc., Yokohama, JP;

Inventor:

Shinji Sugihara, Ota-ku, JP;

Assignee:

NuFlare Technology, Inc., Yokohama, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/22 (2006.01); G01N 23/2251 (2018.01); G06T 7/00 (2017.01); G06T 7/33 (2017.01); H01J 37/09 (2006.01); H01J 37/244 (2006.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
H01J 37/222 (2013.01); G01N 23/2251 (2013.01); G06T 7/001 (2013.01); G06T 7/337 (2017.01); H01J 37/244 (2013.01); G01N 2223/401 (2013.01); G06T 2207/30148 (2013.01); H01J 37/09 (2013.01); H01J 37/28 (2013.01); H01J 2237/0453 (2013.01); H01J 2237/226 (2013.01); H01J 2237/2617 (2013.01); H01J 2237/2817 (2013.01);
Abstract

A pattern inspection apparatus includes an actual outline image generation circuit to generate an actual outline image of a predetermined region defined by a function, where the gray scale value of each pixel in the predetermined region including plural actual image outline positions on an actual image outline of a figure pattern in an inspection image is dependent on a distance from the center of a pixel concerned to the closest actual image outline position in the plural actual image outline positions, and a reference outline image generation circuit to generate a reference outline image of the predetermined region defined by the function, where a gray scale value of each pixel in the predetermined region is dependent on a distance from the center of a pixel concerned to the closest reference outline position in plural reference outline positions on a reference outline to be compared with the actual image outline.


Find Patent Forward Citations

Sugihara, Shinji. (2026). Pattern inspection apparatus, and method for acquiring alignment amount between outlines (U.S. Patent No. 12525425). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12525425

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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