The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 13, 2026

Filed:

Sep. 13, 2021
Applicant:

Synopsys, Inc., Mountain View, CA (US);

Inventors:

Deepak Dattatraya Sherlekar, Cupertino, CA (US);

Victor Moroz, Saratoga, CA (US);

Jamil Kawa, Campbell, CA (US);

Assignee:

Synopsys, Inc., Sunnyvale, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10D 89/10 (2025.01); G06F 30/31 (2020.01); G06F 30/392 (2020.01); H10B 20/00 (2023.01); H10D 84/00 (2025.01); G06F 119/06 (2020.01); G06F 119/12 (2020.01);
U.S. Cl.
CPC ...
G06F 30/392 (2020.01); G06F 30/31 (2020.01); H10B 20/00 (2023.02); H10D 84/00 (2025.01); H10D 89/10 (2025.01); G06F 2119/06 (2020.01); G06F 2119/12 (2020.01);
Abstract

Embodiments relate to designing an integrated circuit using a cell that includes a mixed diffusion break. The cell has first and second edges, where the second edge is opposite from the first edge. The cell has a first dummy transistor spanning between the first edge of the cell and an edge of a first diffusion break. The first diffusion break may be centered under the first dummy transistor. The first dummy transistor and the first diffusion break may form a single diffusion break. Additionally, the cell has a second dummy transistor spanning between the second edge of the cell and an edge of a second diffusion break. The second dummy transistor may span a distance of half of a gate pitch into the cell and be centered over the second edge. The second dummy transistor and the second diffusion break may form a double diffusion break.


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