The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 13, 2026
Filed:
Sep. 15, 2021
Applicant:
Resonac Corporation, Tokyo, JP;
Inventors:
Satoshi Furukawa, Tokyo, JP;
Tomohiro Iwano, Tokyo, JP;
Shigeki Kubota, Tokyo, JP;
Atsuko Ueda, Tokyo, JP;
Koichi Kagesawa, Tokyo, JP;
Assignee:
Resonac Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09G 1/02 (2006.01); B24B 37/04 (2012.01); C09K 3/14 (2006.01); H01L 21/3105 (2006.01);
U.S. Cl.
CPC ...
C09G 1/02 (2013.01); B24B 37/044 (2013.01); C09K 3/14 (2013.01); H01L 21/31053 (2013.01);
Abstract
A slurry containing: abrasive grains; a compound X having 3 or more carbon atoms; and water, in which the abrasive grains contain cerium oxide, and a dispersion term dD in Hansen solubility parameters of the compound X is 18.0 MPaor less. A polishing method including polishing a surface to be polished by using this slurry.