The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 06, 2026

Filed:

May. 20, 2022
Applicant:

Taiwan Semiconductor Manufacturing Company Limited, Hsinchu, TW;

Inventors:

Hui-Min Huang, Taoyuan, TW;

Kai Jun Zhan, Taoyuan, TW;

Yi Chen Wu, Taichung, TW;

Wei-Hung Lin, Xinfeng Township, TW;

Ming-Da Cheng, Taoyuan, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 23/00 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01L 24/81 (2013.01); H01J 37/3244 (2013.01); H01J 37/32825 (2013.01); H01L 24/75 (2013.01); H01L 24/16 (2013.01); H01L 2224/16227 (2013.01); H01L 2224/16237 (2013.01); H01L 2224/16238 (2013.01); H01L 2224/75302 (2013.01); H01L 2224/81092 (2013.01); H01L 2224/81097 (2013.01); H01L 2224/81204 (2013.01); H01L 2224/81895 (2013.01);
Abstract

A disclosed system is configured to bond a chip to a substrate and includes a chip processing subsystem that is configured to receive the chip and to expose the chip to a first plasma, and a substrate processing subsystem that is configured to receive the substrate and to expose the substrate to a second plasma. The system further includes a bonding subsystem that is configured to align the chip with the substrate, to force the chip and the substrate into direct mechanical contact with one another by application of a compressive force, and to apply heat to at least one of the chip or the substrate. Application of the compressive force and the heat thereby bonds the chip to the substrate. The first and second plasmas may include H/N, H/Ar, H/He, NH/N, NH/Ar, or NH/He and the chip and substrate may be maintained in a low oxygen environment.


Find Patent Forward Citations

Huang, Hui-Min. (2026). Systems for fluxless bonding using an atmospheric pressure plasma and methods for performing the same (U.S. Patent No. 12519080). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12519080

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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