The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 30, 2025
Filed:
Aug. 04, 2021
Kla Corporation, Milpitas, CA (US);
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Evgeniia Butaeva, San Jose, CA (US);
Gildardo Delgado, Livermore, CA (US);
Grace Chen, Los Gatos, CA (US);
John Savee, San Francisco, CA (US);
Matthew Derstine, Los Gatos, CA (US);
Vera (Guorong) Zhuang, San Jose, CA (US);
Gary V. Lopez Lopez, Sunnyvale, CA (US);
Felix Lange, Oberkochen, DE;
Larissa Walter, Oberkochen, DE;
KLA Corporation, Milpitas, CA (US);
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
An optical system includes a bulk material including a fluorine (F)-containing optical material. The bulk material is exposed to an environment at a pressure ranging from atmospheric to vacuum when the bulk material is under extreme ultra-violet (EUV), vacuum ultra-violet (VUV), deep ultra-violet (DUV) and/or UV radiation. The environment includes at least one type of gas or vapor. The at least one type of gas or vapor includes polar molecules.