The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 09, 2025
Filed:
Dec. 13, 2021
Samsung Electronics Co., Ltd., Suwon-si, KR;
Kuihyun Yoon, Yongin-si, KR;
Sang Ki Nam, Seongnam-si, KR;
Kwonsang Seo, Suwon-si, KR;
Sungho Jang, Hwaseong-si, KR;
Jungmin Ko, Seoul, KR;
Nam Kyun Kim, Pyeongtaek-si, KR;
Tae-Hyun Kim, Suwon-si, KR;
Seunghan Baek, Busan, KR;
Seungbin Ahn, Incheon, KR;
Jungmo Yang, Pyeongtaek-si, KR;
Changheon Lee, Seongnam-si, KR;
Kangmin Jeon, Hwaseong-si, KR;
SAMSUNG ELECTRONICS CO., LTD., Suwon-si, KR;
Abstract
A plasma confinement ring includes a lower ring, an upper ring on the lower ring, and a connection ring extended to connect the lower ring to the upper ring. The lower ring includes a lower center hole vertically penetrating the lower ring at a center of the lower ring and at least one slit penetrating the lower ring in a region outside the lower center hole. The slit is structured to pass a more amount of air or gas at a first portion closer to the center of the lower ring than at a second portion farther from the center of the lower ring.