The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 02, 2025
Filed:
Jun. 08, 2023
Applicant:
Entegris, Inc., Billerica, MA (US);
Inventors:
Daniela White, Ridgefield, CT (US);
Michael L. White, Ridgefield, CT (US);
Youngmin Kim, Suwon-si, KR;
Akshay Rajopadhye, Gainesville, FL (US);
Atanu K. Das, Danbury, CT (US);
Assignee:
ENTEGRIS, INC., Billerica, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23G 1/18 (2006.01); B81C 1/00 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
C23G 1/18 (2013.01); B81C 1/00857 (2013.01); H01L 21/02057 (2013.01); B81C 2201/0133 (2013.01); B81C 2201/0142 (2013.01);
Abstract
The present disclosure relates to removal compositions for at least partially removing post-chemical mechanical polishing (post-CMP) residues from the surface of a microelectronic device. The removal compositions comprise an aqueous base composition and various molybdenum etching inhibitors that reduce the amount of molybdenum removed from the surface of the microelectronic device compared to the aqueous base composition.