The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 25, 2025

Filed:

Aug. 26, 2022
Applicant:

Yangtze Memory Technologies Co., Ltd., Hubei, CN;

Inventors:

Shasha Liu, Hubei, CN;

Xiaoming Mao, Hubei, CN;

Jing Gao, Hubei, CN;

Zongliang Huo, Hubei, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10B 43/20 (2023.01); G11C 8/14 (2006.01); G11C 16/08 (2006.01);
U.S. Cl.
CPC ...
H10B 43/20 (2023.02); G11C 8/14 (2013.01); G11C 16/08 (2013.01);
Abstract

A semiconductor device includes a first stack of alternating first word line layers and first insulating layers over a semiconductor layer. A first channel structure extends from the semiconductor layer and through a first array region of the first stack. A second stack of alternating second word line layers and second insulating layers are over the first stack. A second channel structure extends from the first channel structure and through a second array region of the second stack. A thickness of a particular first insulating layer, which is positioned closest to the second stack relative to other first insulating layers, is a sum of at least two times an average thickness of the other first insulating layers and at least one time an average thickness of the first word line layers in the first array region.


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