The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 25, 2025

Filed:

Oct. 11, 2022
Applicant:

Yangtze Memory Technologies Co., Ltd., Wuhan, CN;

Inventor:

Meng Yan, Wuhan, CN;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 23/00 (2006.01); H01L 21/768 (2006.01); H01L 23/532 (2006.01); H01L 23/538 (2006.01);
U.S. Cl.
CPC ...
H01L 24/94 (2013.01); H01L 21/76864 (2013.01); H01L 23/53238 (2013.01); H01L 23/5384 (2013.01);
Abstract

A hybrid wafer bonding method includes providing a first semiconductor structure and providing a second semiconductor structure. The first semiconductor structure includes a first via structure in a first dielectric layer, the first via structure including a first contact via surface. The second semiconductor structure includes a second via structure in a second dielectric layer, the second via structure including a second contact via surface. The first contact via surface is bonded with the second contact via surface. A barrier structure is formed surrounding the second contact via surface along a lateral direction and extending into each of the first contact via surface and the second dielectric layer in a vertical direction. The first via structure includes first metal impurities doped in a bulk region of the first via structure, and the second via structure includes second metal impurities doped in a bulk region of the second via structure.


Find Patent Forward Citations

Loading…