The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 18, 2025

Filed:

Sep. 23, 2022
Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventors:

Arjen Benjamin Storm, Delft, NL;

Johan Frederik Cornelis Van Gurp, Berkel en Rodenrijs, NL;

Johannes Cornelis Jacobus De Langen, Delft, NL;

Aaron Yang-Fay Ayal, Roosendaal, NL;

Michiel Matthieu Bruinink, Rijswijk, NL;

Christiaan Ruben Van Den Berg, 's-Gravenzande, NL;

Christiaan Otten, IJsselstein, NL;

Laura Dinu Gurtler, Delft, NL;

Marc Smits, Pijnacker, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/153 (2006.01); G03F 9/00 (2006.01); H01J 37/09 (2006.01); H01J 37/20 (2006.01); H01J 37/28 (2006.01); H01J 37/317 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3177 (2013.01); G03F 9/7003 (2013.01); H01J 37/09 (2013.01); H01J 37/153 (2013.01); H01J 37/20 (2013.01); H01J 37/28 (2013.01); H01J 2237/24592 (2013.01); H01J 2237/2817 (2013.01);
Abstract

Disclosed herein is a substrate stack comprising a plurality of substrates, wherein: each substrate in the substrate stack comprises at least one alignment opening set; the at least one alignment opening set in each substrate is aligned for a light beam to pass through corresponding alignment openings in each substrate; and each substrate comprises at least one alignment opening that has a smaller diameter than the corresponding alignment openings in the other substrates.


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