The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 18, 2025

Filed:

Oct. 02, 2020
Applicant:

L'air Liquide, Société Anonyme Pour L'etude ET L'exploitation Des Procédés Georges Claude, Paris, FR;

Inventors:

Toshiyuki Nakagawa, Kobe, JP;

Shingo Okubo, Tsukuba, JP;

Kazuma Suzuki, Tsukuba, JP;

Ikuo Suzuki, Tsukuba, JP;

Koji Ishida, Tsukuba, JP;

Takashi Kameoka, Tsukuba, JP;

Kazutaka Yanagita, Tsukuba, JP;

Mikio Goto, Minato, JP;

Koji Matsumoto, Nagano, JP;

Fumikazu Nozawa, Sakura, JP;

Terumasa Koura, Tsukuba, JP;

Kohei Tarutani, Tsukuba, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/44 (2006.01); C23C 16/448 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4485 (2013.01); C23C 16/45557 (2013.01); C23C 16/45561 (2013.01);
Abstract

Supply system include a first vessel containing the precursor, a second vessel, a first gas conduit fluidically connecting the first vessel to the second vessel, wherein a pressure reduction device and a flow control device are fluidically mounted therein, a second gas conduit fluidically connecting the second vessel to a point of use, and a pressure gauge downstream the pressure reduction device for measuring a partial pressure of the precursor in the second vessel, wherein the partial pressure of the precursor in the second vessel is at a pressure lower than the saturated vapor pressure of the precursor at the temperature of the second vessel and higher than an inlet pressure requirement of the flow control device at the point of use. Methods for using the supply system are also disclosed.


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