The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 04, 2025

Filed:

Aug. 08, 2023
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu, TW;

Inventors:

Chia-Hao Chang, Hsinchu, TW;

Lin-Yu Huang, Hsinchu, TW;

Li-Zhen Yu, Hsinchu, TW;

Cheng-Chi Chuang, New Taipei, TW;

Kuan-Lun Cheng, Hsin-Chu, TW;

Chih-Hao Wang, Hsinchu County, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/768 (2006.01); H01L 21/76 (2006.01); H01L 23/528 (2006.01); H01L 23/532 (2006.01); H10D 30/62 (2025.01); H10D 30/67 (2025.01); H10D 64/01 (2025.01); H01L 21/02 (2006.01); H10D 62/10 (2025.01);
U.S. Cl.
CPC ...
H01L 21/7682 (2013.01); H01L 21/76 (2013.01); H01L 21/76834 (2013.01); H01L 21/76897 (2013.01); H01L 23/5286 (2013.01); H01L 23/53295 (2013.01); H10D 30/6219 (2025.01); H10D 30/6735 (2025.01); H10D 30/6757 (2025.01); H10D 64/01 (2025.01); H01L 21/02172 (2013.01); H01L 21/02274 (2013.01); H10D 62/121 (2025.01);
Abstract

A semiconductor structure includes first and second epitaxial features, at least one semiconductor channel layer connecting the first and second epitaxial features, and a gate structure engaging the semiconductor channel layer. The first and second epitaxial features, the semiconductor channel layer, and the gate structure are at a frontside of the semiconductor structure. The semiconductor structure also includes a backside metal wiring layer at a backside of the semiconductor structure, and a backside conductive contact electrically connecting the first epitaxial feature to the backside metal wiring layer. The backside metal wiring layer is spaced away from the gate structure with an air gap therebetween.


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