The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 28, 2025

Filed:

Oct. 11, 2022
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Sipeng Gu, Clifton Park, NY (US);

Qintao Zhang, Mt Kisco, NY (US);

Kyu-Ha Shim, Andover, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10B 12/00 (2023.01); H10D 30/01 (2025.01);
U.S. Cl.
CPC ...
H10B 12/056 (2023.02); H10D 30/024 (2025.01);
Abstract

Disclosed herein are approaches for forming contacts in a 4Fvertical dynamic random-access memory device. One method includes providing a plurality of fins extending from a substrate, forming a spacer layer over the plurality of fins, and etching the substrate to expose a base portion of the plurality of fins. The method may include forming a doped layer along the base portion of the plurality of fins and along an upper surface of the substrate, and forming an oxide spacer over the doped layer.


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