The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 21, 2025
Filed:
Dec. 19, 2019
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Jan-Gerard Cornelis Van Der Toorn, Eindhoven, NL;
Zhong-Wei Chen, San Jose, CA (US);
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/09 (2006.01); H01J 37/00 (2006.01); H01J 37/22 (2006.01);
U.S. Cl.
CPC ...
H01J 37/09 (2013.01); H01J 37/00 (2013.01); H01J 37/226 (2013.01); H01J 2237/026 (2013.01);
Abstract
A charged particle inspection system may include a shielding plate having an aperture or more than one aperture, for example, to permit additional inspection by an additional instrument requiring a line of sight to the area of interest. A field shaping element, such as a window element or a raised rim, is placed at the aperture to prevent or reduce a component of an electric field.