The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 14, 2025

Filed:

Dec. 08, 2021
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Ruilong Xie, Niskayuna, NY (US);

Stuart Sieg, Albany, NY (US);

Somnath Ghosh, Clifton Park, NY (US);

Kisik Choi, Watervliet, NY (US);

Kevin Shawn Petrarca, Newburgh, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/768 (2006.01); H01L 21/74 (2006.01); H01L 23/48 (2006.01); H01L 23/528 (2006.01); H01L 23/535 (2006.01); H10D 84/01 (2025.01); H10D 84/03 (2025.01); H10D 84/83 (2025.01);
U.S. Cl.
CPC ...
H01L 21/76898 (2013.01); H01L 23/481 (2013.01); H10D 84/83 (2025.01);
Abstract

A semiconductor device includes a first buried power rail (BPR) disposed through etch stop layers and a second BPR disposed in direct contact with the first BPR, where the first BPR has a larger critical dimension (CD) than the second BPR. A bottom surface of the first BPR directly contacts a via-to buried power rail (VBPR) contact. Source/drain contacts (CA) are disposed adjacent the VBPR contact and source/drain regions collectively defining middle-of-line (MOL) components. Back-end-of-line (BEOL) components are then constructed adjacent to the MOL components, and the MOL and BEOL components bond to a carrier wafer. The second BPR is then constructed on the carrier wafer.


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