The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 14, 2025

Filed:

Feb. 24, 2023
Applicant:

Entegris, Inc., Billerica, MA (US);

Inventors:

Jakub Rybczynski, Arlington, MA (US);

Steven Donnell, Burlington, MA (US);

Yan Liu, Lexington, MA (US);

Caleb Minsky, Medfield, MA (US);

Chandra Venkatraman, Tyngsboro, MA (US);

Carlo Waldfried, Middleton, MA (US);

Assignee:

ENTEGRIS, INC., Billerica, MA (US);

Primary Examiner:
Int. Cl.
CPC ...
H01L 21/683 (2006.01);
U.S. Cl.
CPC ...
H01L 21/6833 (2013.01);
Abstract

Described are electrostatic chucks that are useful to support a workpiece during a step of processing the workpiece, the electrostatic chuck including a pattern of charge dissipation lines on an insulating layer, the lines having a first conductive layer and a second conductive layer and being arranged to define enclosed fields of the insulating layer between the lines.


Find Patent Forward Citations

Quick Actions:

Rybczynski, Jakub. (2025). Electrostatic chuck with a charge dissipation structure (U.S. Patent No. 12444636). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12444636

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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