The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 14, 2025

Filed:

Feb. 29, 2024
Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;

Inventors:

Wei-Jie Huang, Hsinchu, TW;

Yu-Ching Lo, Hsinchu, TW;

Ching-Pin Yuan, Hsinchu, TW;

Wen-Chih Lin, Hsinchu, TW;

Cheng-Yu Kuo, Kaohsiung, TW;

Yi-Yang Lei, Taichung, TW;

Ching-Hua Hsieh, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/00 (2006.01); B32B 38/18 (2006.01); H01L 21/48 (2006.01);
U.S. Cl.
CPC ...
B32B 38/1858 (2013.01); H01L 21/4857 (2013.01); H01L 24/96 (2013.01);
Abstract

A lamination chuck for lamination of film materials includes a support layer and a top layer. The top layer is disposed on the support layer. The top layer includes a polymeric material having a Shore A hardness lower than a Shore hardness of a material of the support layer. The top layer and the support layer have at least one vacuum channel formed therethrough, vertically extending from a top surface of the top layer to a bottom surface of the support layer.


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