The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 07, 2025

Filed:

Feb. 04, 2022
Applicant:

Infineon Technologies Austria Ag, Villach, AT;

Inventors:

Jyotshna Bhandari, Villach, AT;

Gerald Patterer, Kirchbach, AT;

Maximilian Roesch, St. Magdalen, AT;

Werner Schustereder, Villach, AT;

Stanislav Vitanov, Villach, AT;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10D 64/01 (2025.01); H10D 64/27 (2025.01); H10D 64/66 (2025.01); H10D 84/83 (2025.01); H10D 64/00 (2025.01);
U.S. Cl.
CPC ...
H10D 64/513 (2025.01); H10D 64/01 (2025.01); H10D 64/667 (2025.01); H10D 84/83 (2025.01); H10D 64/117 (2025.01);
Abstract

The application relates to a semiconductor power device including a semiconductor body in which a transistor device is formed, the transistor device having a gate region and a channel region laterally aside the gate region, the gate region including a gate electrode for controlling a channel formation in the channel region, and a gate dielectric laterally between the channel region and the gate electrode. The gate electrode includes a gate electrode bulk region and a gate electrode layer laterally between the gate dielectric and the gate electrode bulk region. The gate electrode layer is made of a doped metallically conductive material.


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