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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12438045 B1

PDFFull Text
Date of Patent:
Oct. 07, 2025

Filed:

Mar. 07, 2022

Semiconductor structure formation

Applicant:

Taiwan Semiconductor Manufacturing Company Limited, Hsinchu, TW;

Inventors:

Zheng-En Bao, Tainan, TW;

Po-Ju Chen, Hsinchu, TW;

Chih-Teng Liao, Hsinchu, TW;

Jiann-Horng Lin, Hsinchu, TW;

Lin-Ting Lin, Taichung, TW;

Assignee:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;

Attorney:

Harrity & Harrity, LLP

Primary Examiner:

Cory W Eskridge

Int. Cl.
CPC ...
H01L 21/768 (2006.01); H01L 21/311 (2006.01); H01L 23/532 (2006.01);
U.S. Cl.
CPC ...
H01L 21/76877 (2013.01); H01L 21/31144 (2013.01); H01L 21/76802 (2013.01); H01L 21/7684 (2013.01); H01L 21/76843 (2013.01); H01L 23/53238 (2013.01);
Abstract

A recovery layer (e.g., a layer of organic and/or tin-based material) is formed within recesses, in which adjacent MEOL or BEOL structures are formed, after plasma ashing and before a trimming process. The recovery layer preserves hardmask material and dielectric material such that upper surfaces of the adjacent MEOL or BEOL structures remain physically separated. As a result, the adjacent MEOL or BEOL remain electrically isolated and functional.

Find Patent Forward Citations

Bao, Zheng-En. (2025). Semiconductor structure formation (U.S. Patent No. 12438045). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12438045

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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