The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 30, 2025

Filed:

Jul. 19, 2022
Applicant:

Carl Zeiss Multisem Gmbh, Oberkochen, DE;

Inventors:

Nicolas Kaufmann, Aalen, DE;

Andreas Adolf, Aalen, DE;

Volker Wieczorek, Neu-Ulm, DE;

Nico Kaemmer, Koenigsbronn, DE;

Christof Riedesel, Aalen, DE;

Stefan Schubert, Oberkochen, DE;

Assignee:

Carl Zeiss MultiSEM GmbH, Oberkochen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/28 (2006.01); H01J 37/147 (2006.01); H01J 37/22 (2006.01); H01J 37/244 (2006.01); H01J 37/26 (2006.01);
U.S. Cl.
CPC ...
H01J 37/222 (2013.01); H01J 37/1474 (2013.01); H01J 37/244 (2013.01); H01J 37/265 (2013.01); H01J 37/28 (2013.01); H01J 2237/1536 (2013.01); H01J 2237/226 (2013.01); H01J 2237/2448 (2013.01); H01J 2237/2803 (2013.01);
Abstract

A multi-beam charged particle microscope and a method of operating a multi-beam charged particle microscope for wafer inspection with high throughput and with high resolution and high reliability are provided. The method of operation and the multi-beam charged particle beam microscope comprises a mechanism for a synchronized scanning operation and image acquisition by a plurality of charged particle beamlets according a selected scan program, wherein the selected scan program can be selected according an inspection task from different scan programs.


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