The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 30, 2025

Filed:

Feb. 13, 2025
Applicant:

Sigray, Inc., Concord, CA (US);

Inventors:

Benjamin Donald Stripe, Berkeley, CA (US);

Wenbing Yun, Walnut Creek, CA (US);

Janos Kirz, Berkeley, CA (US);

Thomas James Smart, Oakland, CA (US);

Mark Antoine Cordier, El Sobrante, CA (US);

Sylvia Jia Yun Lewis, San Francisco, CA (US);

Assignee:

Sigray, Inc., Benicia, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21K 1/06 (2006.01); G21K 1/02 (2006.01);
U.S. Cl.
CPC ...
G21K 1/02 (2013.01);
Abstract

An apparatus includes at least one x-ray source configured to generate x-rays and at least one capillary x-ray focusing optic configured to receive and focus at least some of the generated x-rays into a focused x-ray beam. The apparatus further includes at least one x-ray optical component configured to receive the generated x-rays and/or the focused x-ray beam such that a focus size δof the focused x-ray beam is smaller than a focus size δof the focused x-ray beam without the at least one x-ray optical component.


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