The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 30, 2025
Filed:
Jan. 06, 2025
Sigray, Inc., Concord, CA (US);
Benjamin Donald Stripe, Berkeley, CA (US);
Wenbing Yun, Walnut Creek, CA (US);
Janos Kirz, Berkeley, CA (US);
Sigray, Inc., Benicia, CA (US);
Abstract
An apparatus includes an x-ray optic system configured to receive x-rays from an x-ray source, to focus at least some of the x-rays to form a focused x-ray beam, and to irradiate a portion of a sample with the focused x-ray beam. The focused x-ray beam has a depth-of-focus and a focused x-ray spot at the sample. The apparatus further includes a microscope having an objective configured to receive and focus light from the portion of the sample. The objective has an object plane and a field-of-view. The object plane is within a range centered on the depth-of-focus of the focused x-ray beam, the range having a width ten times the depth-of-focus, and the focused x-ray spot is within the field-of-view of the objective.