logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12426335 B1

PDFFull Text
Date of Patent:
Sep. 23, 2025

Filed:

Aug. 07, 2023

Reducing k values of dielectric films through anneal

Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Inventors:

Wen-Kai Lin, Hsinchu, TW;

Che-Hao Chang, Hsinchu, TW;

Chi On Chui, Hsinchu, TW;

Yung-Cheng Lu, Hsinchu, TW;

Szu-Ying Chen, Hsinchu, TW;

Assignee:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Attorney:

Slater Matsil, LLP

Primary Examiner:

Zandra V Smith

Assistant Examiner:

Andre C Stevenson

Int. Cl.
CPC ...
H10D 64/01 (2025.01); H01L 21/02 (2006.01); H10D 30/67 (2025.01); H10D 62/10 (2025.01); H10D 64/23 (2025.01);
U.S. Cl.
CPC ...
H10D 64/018 (2025.01); H01L 21/0228 (2013.01); H10D 30/6735 (2025.01); H10D 62/118 (2025.01); H10D 64/01 (2025.01); H10D 64/017 (2025.01); H10D 64/258 (2025.01);
Abstract

A method includes performing an atomic layer deposition (ALD) process to form a dielectric layer on a wafer. The ALD process comprises an ALD cycle includes pulsing calypso ((SiCl)CH), purging the calypso, pulsing ammonia, and purging the ammonia. The method further includes performing a wet anneal process on the dielectric layer, and performing a dry anneal process on the dielectric layer.

Find Patent Forward Citations

Lin, Wen-Kai. (2025). Reducing k values of dielectric films through anneal (U.S. Patent No. 12426335). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12426335

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…