The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 23, 2025
Filed:
Jun. 28, 2023
Tokyo Electron Limited, Tokyo, JP;
Hiroki Sakurai, Kumamoto, JP;
Yenrui Hsu, Kumamoto, JP;
Shoki Mizuguchi, Kumamoto, JP;
Nobuhiro Ogata, Kumamoto, JP;
Shinichi Umeno, Kumamoto, JP;
Kazuya Goda, Kumamoto, JP;
Minsung Kim, Kumamoto, JP;
Hiroyuki Higashi, Kumamoto, JP;
TOKYO ELECTRON LIMITED., Tokyo, JP;
Abstract
A substrate processing apparatus according to the present disclosure includes a substrate holding unit, a fluid supplying unit, a processing-liquid supplying unit, a nozzle, a fluid amount adjusting unit, and a controller. The substrate holding unit holds a substrate to be rotatable. The fluid supplying unit supplies fluid including pressurized vapor or mist of deionized water. The processing-liquid supplying unit supplies processing liquid including at least a sulfuric acid. The nozzle is connected to the fluid supplying unit and the processing-liquid supplying unit to discharge mixed fluid of the fluid and the processing liquid toward the substrate. The fluid amount adjusting unit adjusts a flow volume of the fluid that is flowing through the fluid supplying unit. The controller controls the fluid amount adjusting unit to adjust a ratio of the fluid to the processing liquid.