The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 23, 2025
Filed:
Mar. 21, 2023
National Technology & Engineering Solutions of Sandia, Llc, Albuquerque, NM (US);
Amber Lynn Dagel, Lafayette, CO (US);
Andrew Eugene Hollowell, Albuquerque, NM (US);
Patrick Sean Finnegan, Albuquerque, NM (US);
Kyle R. Thompson, Albuquerque, NM (US);
Roger Derek West, Albuquerque, NM (US);
Johnathan Mulcahy-Stanislawczyk, Albuquerque, NM (US);
Ryan Nicolas Goodner, Albuquerque, NM (US);
National Technology & Engineering Solutions of Sandia, LLC, Albuquerque, NM (US);
Abstract
A mask for use in a speckle-based x-ray or neutron phase contrast imaging system and methods of making the mask are disclosed. The mask may either absorb or change the phase of the incident x-ray or neutron beam. The mask in various embodiments has consistent statistics across the mask, is locally unique (thereby avoiding ambiguous correlations), has a speckle size on the order of the imaging system's resolution, has a speckle pattern that is visible through the sample being imaged, and/or is matched to the energy level of the imaging system and the sample density. These mask attributes are controlled by the method and materials used in the fabrication of the mask. Various embodiments use a pseudo-random binary array for generating the required speckle pattern.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile