The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 23, 2025

Filed:

Apr. 04, 2023
Applicant:

Applied Materials Israel Ltd., Rehovot, IL;

Inventors:

Yehonatan Hai Ofir, Rehovot, IL;

Yotam Nissim Ben Shoshan, Rehovot, IL;

Ran Badanes, Rishon le-Zion, IL;

Boris Sherman, Rehovot, IL;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 7/00 (2017.01); G06N 3/0455 (2023.01);
U.S. Cl.
CPC ...
G06T 7/001 (2013.01); G06N 3/0455 (2023.01); G06T 2207/20081 (2013.01); G06T 2207/20084 (2013.01);
Abstract

There is provided a system and method of examination a semiconductor specimen. The method includes obtaining a runtime image of the specimen; processing the runtime image using a first machine learning (ML) model to extract a set of runtime features representative of a set of patches in the runtime image; and comparing the set of runtime features with a bank of reference features, giving rise to an anomaly map indicative of one or more defective patches in the runtime image. The bank of reference features is previously generated by obtaining a plurality of synthetic reference images generated by a second ML model based on a plurality of actual images; and processing the plurality of synthetic reference images by the first ML model to extract, for each synthetic reference image, a set of reference features representative thereof, giving rise to the bank of reference features.


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