The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 16, 2025

Filed:

Nov. 02, 2023
Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;

Inventors:

Tao-Cheng Liu, Hsinchu, TW;

Shih-Chi Kuo, Hsinchu, TW;

Tsai-Hao Hung, Hsinchu, TW;

Tsung-Hsien Lee, Hsinchu, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10D 1/68 (2025.01); H01L 21/768 (2006.01); H10D 1/66 (2025.01); H10D 84/00 (2025.01);
U.S. Cl.
CPC ...
H10D 1/68 (2025.01); H01L 21/76879 (2013.01); H10D 1/665 (2025.01); H10D 1/716 (2025.01); H10D 84/212 (2025.01);
Abstract

A semiconductor device includes a substrate, a first multilayer capacitor, and a second multilayer capacitor. The first multilayer capacitor includes a first plurality of conductive layers. The semiconductor device further includes a first set of contacts including a first contact electrically connected to a first conductive layer, and a second contact electrically connected to a second conductive layer, wherein the first contact is spaced from the second contact by a first distance. The second multilayer capacitor includes a second plurality of conductive layers. The semiconductor device further includes a second set of contacts including a third contact electrically connected to a third conductive layer, and a fourth contact electrically connected to a fourth conductive layer, wherein the third contact is spaced from the fourth contact by a second distance, and the second distance is different from the first distance.


Find Patent Forward Citations

Loading…