The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 26, 2025
Filed:
May. 25, 2022
Applicant:
Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;
Inventors:
Hsiu-Ling Chen, Taoyuan, TW;
Chih-Teng Liao, Hsinchu, TW;
Jen-Chih Hsueh, Kaohsiung, TW;
Chen-Wei Pan, Zhubei, TW;
Yu-Li Lin, Kaohsiung, TW;
Assignee:
Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10D 64/27 (2025.01); H01L 21/28 (2025.01); H10D 30/01 (2025.01); H10D 30/62 (2025.01); H10D 64/01 (2025.01); H10D 64/66 (2025.01); H10D 84/01 (2025.01); H10D 84/03 (2025.01); H10D 84/85 (2025.01);
U.S. Cl.
CPC ...
H10D 64/518 (2025.01); H10D 30/024 (2025.01); H10D 30/62 (2025.01); H10D 64/017 (2025.01); H10D 84/853 (2025.01);
Abstract
Embodiments include methods and devices which utilize dummy gate profiling to provide a profile of a dummy gate which has narrowing in the dummy gate. The narrowing causes a neck in the dummy gate. When the dummy gate is replaced in a gate replacement process, the necking provides control of an etch-back process. Space is provided between the replacement gate and a subsequently formed self-aligned contact.