The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 26, 2025

Filed:

Sep. 28, 2020
Applicant:

Hitachi High-tech Corporation, Tokyo, JP;

Inventors:

Teruo Kohashi, Tokyo, JP;

Hideo Morishita, Tokyo, JP;

Tatsuro Ide, Tokyo, JP;

Junichi Katane, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/26 (2006.01);
U.S. Cl.
CPC ...
H01J 37/268 (2013.01); H01J 37/265 (2013.01); H01J 2237/24557 (2013.01); H01J 2237/30416 (2013.01);
Abstract

To implement a charged particle beam device including an iron thin film spin detector. The charged particle beam device includes: a charged particle columnconfigured to perform scanning on a samplewith a charged particle beam; a spin detector including an iron thin film, a plurality of coilsconfigured to magnetize the iron thin film, a conveying lensconfigured to focus, on the iron thin film, secondary electronsemitted from the sample due to irradiation of the charged particle beam, and an electron detectorconfigured to detect backscattered electronsemitted due to the iron thin film being irradiated with the secondary electrons; and a control unitconfigured to control switching of a magnetization direction of the iron thin film in synchronization with scanning of one line with the charged particle beam from the charged particle column.


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