The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 19, 2025

Filed:

Sep. 20, 2019
Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventors:

Jian Zhang, San Jose, CA (US);

Yixiang Wang, Fremont, CA (US);

Zhiwen Kang, Milpitas, CA (US);

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/95 (2006.01); G01N 21/88 (2006.01);
U.S. Cl.
CPC ...
G01N 21/9505 (2013.01); G01N 21/8806 (2013.01); G01N 2021/8816 (2013.01); G01N 2021/8835 (2013.01); G01N 2021/8845 (2013.01);
Abstract

An illumination unit comprising a first electromagnetic wave source including circuitry for outputting a first electromagnetic wave in a first direction to illuminate a first region of a sample; a second electromagnetic wave source including circuitry for outputting a second electromagnetic wave in a second direction substantially opposite to the first direction; and a reflector configured to reflect the second electromagnetic wave substantially in the first direction to illuminate a second region of the sample.


Find Patent Forward Citations

Loading…