The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 05, 2025
Filed:
Apr. 08, 2021
Asml Holding N.v., Veldhoven, NL;
Andrew Judge, Monroe, CT (US);
Ravi Chaitanya Kalluri, Bethel, CT (US);
Michal Emanuel Pawlowski, Norwalk, CT (US);
James Hamilton Walsh, Newtown, CT (US);
Justin Lloyd Kreuzer, Trumbull, CT (US);
ASML Holding N.V., Veldhoven, NL;
Abstract
An inspection system (), a lithography apparatus, and an inspection method are provided. The inspection system () includes an illumination system (), a detection system (), and processing circuitry (). The illumination system generates a first illumination beam () at a first wavelength and a second illumination beam () at a second wavelength. The first wavelength is different from the second wavelength. The illumination system irradiates an object () simultaneously with the first illumination beam and the second illumination beam. The detection system receives radiation () scattered by a particle () present at a surface () of the object at the first wavelength. The detection system generates a detection signal. The processing circuitry determines a characteristic of the particle based on the detection signal.