The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 05, 2025

Filed:

Nov. 26, 2020
Applicants:

Safran, Paris, FR;

Association Pour LA Recherche ET Le Développement Des Méthodes ET Processus Industriels, Paris, FR;

Inventors:

Edward Romero, Moissy-Cramayel, FR;

Alexiane Arnaud, Moissy-Cramayel, FR;

Clément Remacha, Moissy-Cramayel, FR;

Henry Proudhon, Moissy-Cramayel, FR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 23/2055 (2018.01); G01N 23/20025 (2018.01);
U.S. Cl.
CPC ...
G01N 23/2055 (2013.01); G01N 23/20025 (2013.01); G01N 2223/316 (2013.01); G01N 2223/401 (2013.01);
Abstract

A device and method for measuring angles of orientation of an x-ray imaging system including an x-ray source, an x-ray detector and a sample holder arranged to receive a sample to be analysed. The method includes: emitting a polychromatic x-ray beam through a reference sample installed on the sample holder in order to form a diffraction pattern on the sensing area of the x-ray detector, generating, with the x-ray detector, an observed image comprising the diffraction pattern, and determining the orientation of the x-ray source and the orientation of the x-ray detector by comparing the observed image with at least one target image comprising a diffraction pattern obtained for the reference sample with preset orientations of the x-ray source and of the x-ray detector.


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