The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 29, 2025

Filed:

Jan. 10, 2023
Applicant:

Changxin Memory Technologies, Inc., Hefei, CN;

Inventors:

Gongyi Wu, Hefei, CN;

Yachao Xu, Hefei, CN;

Xiaoyu Yang, Hefei, CN;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10B 12/00 (2023.01);
U.S. Cl.
CPC ...
H10B 12/482 (2023.02); H10B 12/0335 (2023.02); H10B 12/315 (2023.02);
Abstract

A method for forming a memory includes: forming a bit line structure and a capacitor contact layer, where the bit line structure includes a bit line, a bit line cap layer and a bit line isolation layer, and the capacitor contact layer covers part of a side wall of the bit line isolation layer; forming a stop layer covering the side wall of the bit line isolation layer; forming a capacitor landing layer covering a top surface of the capacitor contact layer; and etching the bit line isolation layer by using the stop layer as an etch stop layer to form an air gap in the bit line isolation layer. Probability of occurrence of a short circuit between the capacitor landing layer and a bit line is reduced.


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