The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 15, 2025
Filed:
Jul. 05, 2021
Applicant:
Nova Ltd., Rehovot, IL;
Inventors:
Yonatan Oren, Kiryat Ono, IL;
Eyal Hollander, Ramat Hasharon, IL;
Elad Schleifer, Rehovot, IL;
Gilad Barak, Rehovot, IL;
Assignee:
NOVA LTD., Rehovot, IL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01J 3/10 (2006.01); G01J 3/02 (2006.01); G01J 3/18 (2006.01); G01J 3/28 (2006.01); G01J 3/44 (2006.01);
U.S. Cl.
CPC ...
G01J 3/10 (2013.01); G01J 3/0208 (2013.01); G01J 3/0248 (2013.01); G01J 3/0291 (2013.01); G01J 3/18 (2013.01); G01J 3/2803 (2013.01); G01J 3/44 (2013.01);
Abstract
Systems and methods for metrology of workpieces such as wafers, using spectrometry of multi-spot-arrays formed over a test area of the tester workpiece, for optically measuring characteristics of the tested workpiece, where the optical metrology system is configured such that the distribution of energy density or flux of the multi-spot-array over the test area of the tested workpiece is such that prevents affecting the workpiece during its testing.