The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 08, 2025

Filed:

Dec. 28, 2021
Applicant:

SK Keyfoundry Inc., Cheongju-si, KR;

Inventor:

Hee Hwan Ji, Daejeon, KR;

Assignee:

SK keyfoundry Inc., Cheongju-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10D 30/60 (2025.01); H10D 30/65 (2025.01); H10D 89/60 (2025.01);
U.S. Cl.
CPC ...
H10D 89/811 (2025.01); H10D 30/603 (2025.01); H10D 30/65 (2025.01);
Abstract

A semiconductor device includes a P-type body region and an N-type drift region disposed in a substrate; a gate electrode, disposed on the P-type body region and the N-type drift region, including a high concentration doping region and a high resistance region, wherein a dopant concentration of the high concentration doping region is higher than a dopant concentration of the high resistance region; a spacer disposed on a side of the gate electrode; a highly doped source region disposed in the P-type body region; and a highly doped drain region disposed in the N-type body region. The high concentration doping region overlaps the P-type body region, and the high resistance region overlaps the N-type drift region.


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