The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 08, 2025
Filed:
Jul. 18, 2022
Applicant:
Onto Innovation Inc., Wilmington, MA (US);
Inventors:
Roman S. Basistyy, Sunny Isles Beach, FL (US);
Jatinder Dhaliwal, Wilmington, MA (US);
Jian Ding, Methuen, MA (US);
Assignee:
Onto Innovation Inc., Wilmington, MA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06T 7/00 (2017.01); G06T 5/20 (2006.01); G06T 7/10 (2017.01);
U.S. Cl.
CPC ...
G06T 7/0008 (2013.01); G06T 5/20 (2013.01); G06T 7/10 (2017.01); G06T 2207/20021 (2013.01); G06T 2207/20081 (2013.01); G06T 2207/30148 (2013.01);
Abstract
Defect detection techniques can be used for inspecting semiconductor devices, such as CMOS image sensors, during the manufacturing process. The defects can include common defects, such as scratches, dirt, etc., as well as low-contrast defects, such as watermarks. The detection technique may use a supervised machine learning network.