The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 08, 2025
Filed:
Nov. 13, 2020
Applicant:
Kla Corporation, Milpitas, CA (US);
Inventors:
Abdurrahman Sezginer, Monte Sereno, CA (US);
Gordon Rouse, Dublin, CA (US);
Manikandan Mariyappan, San Jose, CA (US);
Assignee:
KLA CORPORATION, Milpitas, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06N 20/00 (2019.01); G01N 21/95 (2006.01); G01N 21/956 (2006.01); G06N 20/10 (2019.01);
U.S. Cl.
CPC ...
G06N 20/10 (2019.01); G01N 21/9501 (2013.01); G01N 21/95607 (2013.01); G01N 21/95623 (2013.01); G01N 2021/95615 (2013.01);
Abstract
Context attributes for optical imaging of a patterned layer of a semiconductor die are calculated. Calculating the context attributes includes calculating convolutions of a pattern of the patterned layer with respective kernels of a plurality of kernels, wherein the plurality of kernels is orthogonal. Defects on the semiconductor die are found in accordance with the context attributes.