The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 08, 2025
Filed:
Apr. 21, 2023
Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;
Yao-Tang Lin, Hsinchu, TW;
Tzu-Wen Chen, Hsinchu, TW;
Jian-Yuan Su, Hsinchu, TW;
Ming-Hsin Chen, Hsinchu, TW;
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., Hsinchu, TW;
Abstract
A reticle includes a border section surrounding a pattern section, and gas openings arranged in and passing through the border section. The gas openings are coupled to a gas supply. Each gas opening extends in a first direction inclined to and forming an angle with a reticle center axis that extends perpendicularly away from a front surface of the reticle, and is configured to blow a pressurized gas in the first direction away from the front surface to create an air wall adjacent to and surrounding the front surface, thereby advantageously preventing particles from falling on the front surface of the reticle.