The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 24, 2025

Filed:

May. 25, 2022
Applicant:

University of Electronic Science and Technology of China, Chengdu, CN;

Inventors:

Jinping Zhang, Chengdu, CN;

Yuanyuan Tu, Chengdu, CN;

Rongrong Zhu, Chengdu, CN;

Zehong Li, Chengdu, CN;

Bo Zhang, Chengdu, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10D 12/00 (2025.01); H01L 21/761 (2006.01); H01L 21/765 (2006.01); H10D 12/01 (2025.01); H10D 62/10 (2025.01); H10D 62/17 (2025.01); H10D 64/00 (2025.01);
U.S. Cl.
CPC ...
H10D 12/481 (2025.01); H01L 21/761 (2013.01); H01L 21/765 (2013.01); H10D 12/038 (2025.01); H10D 62/111 (2025.01); H10D 62/393 (2025.01); H10D 64/117 (2025.01);
Abstract

A split gate carrier stored trench bipolar transistor (CSTBT) with current clamping PMOS include a P-type buried layer and a split gate electrode with equal potential to an emitter metal on the basis of the traditional CSTBT, which effectively eliminates the influence of an N-type carrier stored layer on breakdown characteristics of the device through the charge compensation effect, and helps to improve the trade-off relationship between the on-state voltage drop and the turn-off loss. Moreover, the introduction of a parasitic PMOS structure can reduce the saturation current and improve short-circuit safe operating area of the device, reduce the Miller capacitance, and improve the switching speed of the device and reduce the switching loss of the device. In addition, the split gate CSTBT integrating the split gate electrode and gate electrode in the same trench can shorten the distance between PMOS and NMOS channels.


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