The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 17, 2025
Filed:
Jun. 06, 2022
Tokyo Electron Limited, Tokyo, JP;
Minjoon Park, Watervliet, NY (US);
Andrew Metz, Albany, NY (US);
Tokyo Electron Limited, Tokyo, JP;
Abstract
A method of processing a substrate that includes: loading the substrate into a plasma etch chamber, the substrate including a patterned hard mask layer and an underlying layer, the plasma etch chamber including: a chamber part having a surface including a refractory metal; and a first electrode; flowing a process gas into the plasma etch chamber; while flowing the process gas, applying a source power to the first electrode of the plasma etch chamber to generate a plasma in the plasma etch chamber; exposing the surface of the chamber part to the plasma to sputter the refractory metal from the surface of the chamber part; and exposing the substrate to the plasma to deposit the refractory metal onto a portion of the patterned hard mask layer and etch the underlying layer selectively to the patterned hard mask layer.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile