The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 17, 2025

Filed:

Sep. 22, 2021
Applicant:

Carl Zeiss Smt Gmbh, Oberkochen, DE;

Inventors:

Hans Michael Stiepan, Aalen, DE;

Sebastian Fuchs, Aalen, DE;

Jochen Hetzler, Aalen, DE;

Assignee:

CARL ZEISS SMT GMBH, Oberkochen, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 11/24 (2006.01); G01B 9/02 (2022.01); G02B 5/18 (2006.01); G02B 27/00 (2006.01);
U.S. Cl.
CPC ...
G01B 11/2441 (2013.01); G01B 9/02039 (2013.01); G02B 5/1871 (2013.01); G02B 27/0012 (2013.01);
Abstract

Measurement method for interferometrically determining a shape of a test object () surface () includes arranging a first diffractive optical element () in an input wave () beam path, to generate a first test wave () with a wavefront that is adapted to a desired shape of the optical surface, detecting a first interferogram generated by the first test wave after interaction with the test object surface, arranging a different diffractive optical element () in the input wave beam path for generating a further test wave with a wavefront which is adapted to the desired shape of the optical surface, the first and the further diffractive optical elements differing in their respective diffraction structure configurations, capturing a further interferogram generated by the further test wave after interaction with the test object surface, and determining the surface shape of the test object by calculating the two interferograms.


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