The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 10, 2025

Filed:

Oct. 14, 2020
Applicant:

Lam Research Corporation, Fremont, CA (US);

Inventors:

Lawrence Schloss, Palo Alto, CA (US);

Shruti Vivek Thombare, Sunnyvale, CA (US);

Zhongbo Yan, Newark, CA (US);

Patrick A. Van Cleemput, Duvall, WA (US);

Joshua Collins, Sunnyvale, CA (US);

Assignee:

Lam Research Corporation, Fremont, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/768 (2006.01); C23C 16/04 (2006.01); C23C 16/06 (2006.01); C23C 16/455 (2006.01); C23C 16/56 (2006.01); H10B 69/00 (2023.01);
U.S. Cl.
CPC ...
H01L 21/76879 (2013.01); C23C 16/045 (2013.01); C23C 16/06 (2013.01); C23C 16/45553 (2013.01); C23C 16/56 (2013.01); H01L 21/76856 (2013.01); H01L 21/76865 (2013.01); H01L 21/76876 (2013.01); H10B 69/00 (2023.02);
Abstract

Embodiments of methods of filling features with molybdenum (Mo) include depositing a first layer of Mo in a feature including an opening and an interior and non-conformally treating the first layer such that regions near the opening preferentially treated over regions in the interior. In some embodiments, a second Mo layer is deposited on the treated first layer. Embodiments of methods of filling features with Mo include controlling Mo precursor flux to transition between conformal and non-conformal fill.


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